明志科大 教師研發能量
環境資源學院 材料工程系
綜合大樓三樓301-6室 (02)2908-9899 #29089899轉4679
國立臺灣大學 材料科學 博士 chensc@mail.mcut.edu.tw
專長領域
奈米資訊儲存技術(Nanotechnologies for information storage)、透明導電薄膜(Transparent conductive films)、熱電薄膜(Thermoelectric films)、磁性薄膜(Magnetic films)、薄膜製程與分析技術(Thin film Processes and analyses)
陳勝吉
教授
可提供產學合作項目 Available Collaborate Item
研究開發重點 Current Research & Development Focus
產學合作 Industry-University Cooperations
資料不公開 政府計畫/明志科大計畫 Government Projects/MCUT Projects
計畫名稱
111 111年度結合大專校院辦理就業服務補助計畫
109 高性能無機p型氧化物薄膜在鈣鈦礦太陽能電池電洞傳輸層應用之研究
109 鉍碲薄膜之磁控濺鍍製程與電性質研究
109 109 年度技專校院設立選才案辦公室 計畫
108 高性能p型氧化亞銅薄膜之新穎高功率脈衝磁控濺鍍製程開發及應用
108 Zn-Sb合金薄膜之製程及其顯微結構與電性質研究
107 高沉積速率之高性能氧化鎳薄膜創新濺鍍製程開發
107 Zn4Sb3熱電材料之擴散阻障層製程研究
105 材料系實務課程發展計畫
105 104年第2年產業學院計畫材料製程產業人才培育產業學分學程
105 高載子濃度氧化鎳薄膜之新穎電源系統高功率脈衝磁控濺鍍製程開發
105 高可靠度熱電模組封裝技術(1/2)
專利 Patents
年度專利名稱國家類型專利號
112 製造p型氧化亞銅薄膜之方法 國內 發明專利 I790049
111 鍍於耐熱鋼上的抗高溫氧化複合材料層及其製造方法 國內 發明專利 I753441
110 一种用于高温下抗氧化的Cr/CrN/CrAlN梯度塗層及製備方法 大陸 發明專利 ZL 202010194388.9
108 高沉積速率鍍製高性能氧化鎳薄膜之方法 國內 發明專利 I651424
107 高導電性之p型氧化亞銅薄膜製程 國內 發明專利 I614356
106 應用於高密度垂直磁記錄媒體之硬磁性合金薄膜 國內 發明專利 I573302
105 高導電性之氧化鎳薄膜製程 國內 發明專利 I541372
技術移轉 Technology Transfer 資料不公開 論文 SCI/SSCI/AHCI/TSSCI Research Papers
題目刊物名稱起始頁
2020 Study on thermoelectric property optimization of mixed-phase bismuth telluride thin films deposited by co-evaporation process SURFACE & COATINGS TECHNOLOGY 394 125694-1
2020 The Optoelectronic Properties of p-Type Cr-Deficient Cu[Cr0.95-xMg0.05]O-2 Films Deposited by Reactive Magnetron Sputtering MATERIALS 13 2376-1
2020 Structure, mechanical and tribological properties, and oxidation resistance of TaC/a-C:H films deposited by high power impulse magnetron sputtering CERAMICS INTERNATIONAL 46 24986
2020 Transparent Conductivep-Type Cuprous Oxide Films in Vis-NIR Region Prepared by Ion-Beam Assisted DC Reactive Sputtering COATINGS 10 473-1
2020 The Demonstration of 3-D Bi2.0Te2.7Se0.3/Bi0.4Te3.0Sb1.6 Thermoelectric Devices by Ionized Sputter System IEEE TRANSACTIONS ON ELECTRON DEVICES 67 406
2020 The Demonstration of Carbon Nanotubes (CNTs) as Flip-Chip Connections in 3-D Integrated Circuits With an Ultralow Connection Resistance IEEE TRANSACTIONS ON ELECTRON DEVICES 67 2205
2020 Optoelectronic properties of p-type NiO films deposited by direct current magnetron sputtering versus high power impulse magnetron sputtering Applied Surface Science 508 145106-1
2020 p-type semi-transparent conductive NiO films with high deposition rate produced by superimposed high power impulse magnetron sputtering CERAMICS INTERNATIONAL 46 27695
2019 Electrical and magnetic properties of (Al, Co) co-doped ZnO films deposited by RF magnetron sputtering SURFACE & COATINGS TECHNOLOGY 359 390
2019 Comparison of microstructural and optoelectronic properties of NiO:Cu thin films deposited by ion-beam assisted rf sputtering in different gas atmospheres THIN SOLID FILMS 677 103
2019 Comparison of microstructures and magnetic properties in FePt alloy films deposited by direct current magnetron sputtering and high power impulse magnetron sputtering JOURNAL OF ALLOYS AND COMPOUNDS 803 341
2019 Optoelectronic properties of Cu3N thin films deposited by reactive magnetron sputtering and its diode rectification characteristics JOURNAL OF ALLOYS AND COMPOUNDS 789 428
2019 Influence of sputtering power on the electrical properties of In-Sn-Zn oxide thin Films deposited by high power impulse magnetron sputtering Coatings 9 715-1
2019 Contribution of enhanced ionization to the optoelectronic properties of p-type NiO films deposited by high power impulse magnetron sputtering Journal of the European Ceramic Society 39 5285
2019 The adhesion strength and mechanical properties of SiC films deposited on SiAlON buffer layer by magnetron sputtering SURFACE & COATINGS TECHNOLOGY 360 116
2019 The Development of a Dynamic Model to Investigate the Dielectric Layer Thickness Effect for the Device Performance in Triboelectric Nanogenerators IEEE TRANSACTIONS ON ELECTRON DEVICES 66 4478
2018 The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1-xO Films Deposited by Ion Beam Assisted Sputtering COATINGS 8 168-1
2018 p-type conductive NiOx: Cu thin films with high carrier mobility deposited by ion beam assisted deposition CERAMICS INTERNATIONAL 44 3291
2018 Synthesis and characterization of n-type NiO:Al thin films for fabrication of p-n NiO homojunctions JOURNAL OF PHYSICS D-APPLIED PHYSICS 51 105109-1
2018 Effect of Cu, Cu/Ru, or Ru/Cu seed-layer on perpendicular magnetic anisotropy of Co80Pt20 films JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS 459 106
2018 Impact of active layer thickness of nitrogen-doped In-Sn-Zn-O films on materials and thin film transistor performances JOURNAL OF PHYSICS D-APPLIED PHYSICS 51 175101-1
2018 High transmittance in IR region of conductive ITO/AZO multilayers deposited by RF magnetron sputtering CERAMICS INTERNATIONAL 44 6769
2018 Electrolytic Migration of Ag-Pd Alloy Wires with Various Pd Contents JOURNAL OF ELECTRONIC MATERIALS 47 3634
2018 Evaluation of Corrosion Resistance of Ag-Alloy Bonding Wires for Electronic Packaging IEEE TRANSACTIONS ON COMPONENTS PACKAGING AND MANUFACTURING TECHNOLOGY 8 146
2018 Carbon Nanodot Additives Realize High-Performance Air-Stable p-i-n Perovskite Solar Cells Providing Efficiencies of up to 20.2% ADVANCED ENERGY MATERIALS 8 1802323-1
2017 p-type cuprous oxide thin films with high conductivity deposited by high power impulse magnetron sputtering CERAMICS INTERNATIONAL 43 6214
2017 Microstructures and optoelectronic properties of nickel oxide films deposited by reactive magnetron sputtering at various working pressures of pure oxygen environment Ceramics International 43 S369
2017 Characterization and crystallization kinetics of sputtered NiSi thin films for blue laser optical recording application Vacuum 140 144
2017 The electrical stability of In-doped ZnO thin films deposited by RF sputtering JOURNAL OF PHYSICS D-APPLIED PHYSICS 50 045102
2017 Investigation of optoelectronic performance in In, Ga co-doped ZnO thin films with various In and Ga levels Thin Solid Films 641 12
2017 Absorption amelioration of amorphous Si film by introducing metal silicide nanoparticles NANOSCALE RESEARCH LETTERS 12 224
2017 Ag composition gradient CuCr0.93Mg0.07O2/Ag/CuCr0.93Mg0.07O2 coatings with improved p-type optoelectronic performances Journal of Materials Science 52 11537
2017 Thickness-dependent optoelectronic properties of CuCr0.93Mg0.07O2 thin films deposited by reactive magnetron sputtering MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 63 295
2017 Growth Direction Control of ZnO Nanorods on the Edge of Patterned Indium - Tin Oxide/Aluminum-Doped Zinc Oxide Bilayers CRYSTAL GROWTH & DESIGN 17 3100
2016 Modifications in structure and properties of p-type nickel oxide films after argon ion beam bombardment Science of Advanced Materials 8 825
2016 Microstructures, electrical and magnetic properties of (Ga, Co)-ZnO films by radio frequency magnetron co-sputtering SURFACE & COATINGS TECHNOLOGY 303 203
2016 Microstructures and optoelectronic properties of CuxO films deposited by high-power impulse magnetron sputtering Journal of Alloys and Compounds 688 672
2016 Optoelectronic Properties and the Electrical Stability of Ga-Doped ZnO Thin Films Prepared via Radio Frequency Sputtering Materials 9 987-1
2016 Low-Temperature Bonding of Bi0.5Sb1.5Te3 Thermoelectric Material with Cu Electrodes Using a Thin-Film In Interlayer Metallurgical and Materials Transactions A 47A 4767
2016 Solid Liquid Interdiffusion Bonding of Zn4Sb3 Thermoelectric Material with Cu Electrode Journal of Electronic Materials 45 4935
經歷/得獎/著作/計畫輔導 Eexperience/Prize/Book/Project Consultations
經歷

明志科技大學 產學合作發展中心 (02)2908-9899 #3071